Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
نویسندگان
چکیده
The electron-induced fragmentation mechanisms of two important EUV-photoresist monomers methyl isobutyrate and methacrylic acid are investigated in the film gas-phases.
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ژورنال
عنوان ژورنال: Physical Chemistry Chemical Physics
سال: 2021
ISSN: ['1463-9076', '1463-9084']
DOI: https://doi.org/10.1039/d1cp00065a